Process of forming relief maps, pictures, and the like



K WENSCHOW.

PROCESS OF FORMING RELIEF MAPS, PICTURES, AND THE LIKE.

APPLICATION FILED JULY l4, IBIQ- 1,393,255. Pawnted Oct. 11, 1921.

2 SHEETS-SHEET I.

K. WENSCHOW.

Patented Oct. 11, 1921.

2 SHEETS-SHEET 2.

ifbarney.

, now

UNITED STATES PATENT OFFICE.

KARL WENBOEOW, OF IBERLIN-LICHTE RFELDE, GERMANY, ABSIGNOB TO ALBEB'L DE ICHMANN, OF COLOGNE, GERMANY.

PROCESS OF FORMING RELIEF MAPS, PICTURES; AND THE LIKE.

Application filed July 14,

To all whom it my concern:

Be it known that I, KARL WENscHow, a citizen of Germany, residing at Berlm- Lichterfelde, Germany, have invented certain new and useful Im rovements 1n Processes of Forming Relief aps, Pictures, and the like, (for whichI have filed applications in Germany February 14 1918; Austria April 24, 1918; Turkey ay 25, 1918; Hungary April 26, 1918,) of which the following IS a specification.'

My invention relates to the transformation of drawings, etchings, paintings or other patterns of an linen or other suitab e material into reliefs and its particular object is to produce at low cost and with a minimum of labor true reliefs from such atterns, either singly or on a large scale. invention is particularly applicable to tile production of relief ma s and plans.

he novel process embodying my invention substantially consists in fixing the pattern in a frame in such a manner that it is spread out therein. The pattern is then rendered elastic in some sultable way, such as by impregnating it with a suitable liquid such as for instance WGJBIZ' I may however already impregnate the patterh before fixing it,to the frame. Upon the pattern thus treated and fixed a plastic mass is then poured so as to cover it and to fill the spaces inclosedby the frame. The plastlc mass should be tough and sandy. and should allow of being modeled before hardening. I prefer using for this purpose a mixture of ground slate, china-clay, cakum, glue and water. The pattern covered with the plastic mass, is then left to itself, the load placed on it causing it to be so as to assume the form of a cushion. cover is now placed on the frame, so as to inclosethe plastic mass between the frame and the pattern. I refer turning the whole around so that t e pattern is on top, and I then pro-i ceed with the embossing of the attern by treating the pattern with suitab e tools or matrices from above so asto transform it into a relief.

Instead of turning ardund the frame and the pattern with the nntss inclosed between them I may equally well place underneath the pattern loaded with the lastic mass a matrix approaching as near y as possible the form of the relief to beproduced. The

Specification of Letters Patent.

kind on paper, silk,

Patented Oct. 11, 1921.

1919. Serial No. 810,872.

pressure exerted b the pattern suitab latter to stretch to will snu ly fit into matrix;

of elongating more on one side t an on the other is counterbalanced by the elastic pressure exerted b the plastic mass so that the dimensions 0 the pattern remain unaltered. This is of the case of large sized patterns and quite 'es eciall relief ma s and the lik n or er to expe ite the bagging of the paper fabric or the like forming the pattern may also distribute the in such a manner that greater quantities of it are placed on such portions where strongly marked reliefs shall appear. In order to facilitate the transformation of the pattern distribute the liquid used for impregnating it in such a manner, that those portions where strongly marked reliefs are to appear are impregnated with greater quantities of the liquid while tended to ap little or no impregnation at all. By proceeding in this manner can direct the embossing of the pattern in any desired manner. out advantageous y aid of stencils corresponding genera 1y to the form of the surfaces to be impregnated, such stencils being placed on the back of the pattern and the the plastic mass upon y prepared causes this such an extent that it all excavations of the iquid being then applied either in the form 9 of a spray or by means of a brush. however also apply the liquid to the upper surface of the pattern, even after the same has already partly been embossed.

Besides lmpregnatin tain laces I prefer em ossing it either with the ands or with suitable tools from the reverse of the pattern, effected with or without the aid of a thin layer of plastic mass. cause the pattern to stretch to a I may eater extent in these places than in at ers. vThe I treatment 'ust described may also be carried out with t e aid of a matrix placed underneath the pattern. Instead of a matrix I 105 may also employ a pad of suitable material, such asmoistened wedding, plastic mass or the like, in order to prevent the pattern from tearing.

In order to be able to exactly follow thellfl he well-known tendenc of paper particular importance in 66 plastic mass 70 into its final form I may also 76 such'portions as are in-, 80

pear more or less even, receive The impre nation can be carried 86 the pattern in cer- 9 such treatment being y t s treating it I lines of the drawing or the like although the pattern is hanging face downward and is moreover covered with a thin layer of plastic mass I prefer placing on the mass a copy of the drawing to be embossed. If the pattern is locally prepared and treated in the manner described above, the bagging under the influence of the plastic mass will already cause the pattern to be transformed into a relief approaching in general the final form, so that the subsequent embossing by hand or by aid of tools is greatly facilitated.

In order to carry this process out on a big scale the whole frame and matrix may be placed in a press, the mechanical pressure thus applied to the pattern and the plastic mass causing the former to enter into every excavation of the matrix.

In the drawings affixed to this specification and forming part thereof a device adapted to facilitate the carrying out of the recess described is illustrated, Figure 1 bemg a vertical section of the frame with the pattern fixed therein and some of the lastic mass placed on top of the pattern, whi e Fig. 2 is a section of a frame and the cover inserted therein after the plastic mass has exerted its pressure upon the pattern, Fig. 3 showing the same parts in an inverted position. Fig. 4 is a perspective view of a standard adapted to receive the frame shown in Figs. 1 to 3, while Fig. 5 is a side elevation and Fig. 6 a plan of an adjustable table for carrying the frame and the tools used in embossing the pattern.

Referring to the drawings a is the pattern and b and c are the halves of the frame used for holding between them the edges of the pattern placed face downward, the pattern having been impregnated either before being fixed in the frame or thereafter. d is a layer of plastic mass placed upon the back surface of the pattern stretched out in the frame. The frame on being subjected to the pressure exerted by the weight of the plastic mass Wili bag so as to assume the form shown in Fig. 2. A cover is then placed on the frame and the plastic mass, such cover preferably consisting of a frame e and a plate a, hinged to said frame so as to allow more of the plastic mass to be filled in after the whole cover' has been fixed in place by aidof the screw bolts shown in Figs. 2 and 3. Perforations are formed in the plate 0,, thus allowing any plastic mass in excess to escape. The whole frame may then be turned around as shown in Fig. 3, the pattern now lying on top in an upright position. It is now easy to emboss the pattern and the plastic mass by means of tools and matrices so as to produce the desired relief.

In order to prevent the pattern from bagging too much in some places, especially where large sized patterns are concerned a matrix f as shown in dotted lines in Fig. 2 may be placed underneath the frame and pattern, such matrix being a more or less true cast of the relief to be produced; The matrix may also be turned around along with the frame. In order to facilitate the handling and turning around of the frame, pivots g may be provided, and the frame may be suspended by aid of these pivots in a standard frame k such as illustrated in Fig. 4, spring actuated bolts 6 serving for holding the frame in one or the other position.

In embossing the pattern a. I may employ a measuring and embossing appliance is allowing various tools l to be inserted therein and to be adjusted according to requirements. The vertical adjusting of the tools may be carried out with great accuracy by aid of a micrometrical screw m. A device of the kind is especially useful in the production of relief maps for controlling the elevation of contours of equal altitude.

Figs. 5 and 6 illustrate an adjustable frame or table to be used in embossing the pattern. The frame and cover 0,6 are suspended in the table frame It by aid of the pivots g, a movable parallelogram formed by arms 0 and provided with counterwei hts n serving to vary'the position of the tab e and frame, which may be fixed at will by means of the brace'p.

The cover 0 6 instead of presenting a fiat surface may as well have the form of a more or less true atrix adapted to press the plastic mass an pattern into sha such patrix being employed either by itself or in combination with a correspondin matrix placed underneath the pattern. ift/er a pattern has been transformed into a relief in the manner described and the plastic mass has hardened, it may be used as a patrix for producing a number of matrices therefrom by a galvanoplastic process or b casting or in any other suitable manner. lhe matrices thus produced may then be employed in carrying out once more the process described b placin them underneath the pattern, as s own in i 2 or on top of it. This is especially useful in manufacturing reliefs and quite es cially relief ma s on a big scale. In sue a case the entire rame system and matrix may be placed in a suitable press and the pattern andplastic mass may then be forced into the matrix by mechanical pressure, the dies of the press actin either from above or from below accor ing to whether the frame and pattern are in the position shown in Fig. 2 or Fig. 3. In the former case the lower plate a, and frame 6 may be dispensed with altogether and the dieof the press may replace it.

The term pattern as used in this specification and the claims aflixed to it is intended to comprise the drawing, painting, etching,

print or other reproduction and the support carrying it and consisting of paper, fabric or any other suitable material.

- claim: a

1. The process of forming relief maps, etc., which consists in mounting the pattern in a frame, moistening it to render it stretchable, pouring a plastic mass on the back of the pattern, and molding the stretched pattern according to the image thereon.

2. The process of forming relief maps, etc., which consists in clamping the edges of the moistened pattern in a frame, applying a plastic mass to the back'of the pattern to cause it to sag, attaching a cover to the frame on top of the plastic mass, inverting. the frame, tern.

'3. The process of forming relief maps, etc., which consists in clamping the edges of the moistened pattern in a frame, casting a plastic mass within the frame on the back of the pattern, thereby causing the latter to bulge outwardly, limiting the extent of such bulging by a matrix placed beneath the frame, placing a cover on the back of the plastic mass, inverting the frame, and modeling the face of the stretched attern.

4. The process of forming relie maps,

and modeling the face of the patetc., which consists in clamping the pattern by its edges in a frame, moistening the pattern unequally so that it will stretch more in certain places than in others, filling the frame above the pattern with a plastic mass which causes the pattern to stretch and sag, attaching a cover to the frame back of the plastic mass, inverting the frame, and modeling the face of the pattern according to the image thereon.

5. The process of forming relief maps, etc., which consists in clampin the moistened pattern by its edges in a rame, placing a matrix of the pattern beneath the frame, filling in the frame with a plastic mass on the back of the pattern, and applying pressure on top of the plastic mass to force the pattern into the matrix.

6. The process of forming relief maps, etc., which consists in clamping the edges of a pattern in a frame, moistening the pattern especially at those places which are to have the highest relief, pouring a plastic mass on the back of the pattern to'cause it to sag, applying pressure to the back of the plastic mass, inverting the frame, and embossing the face of the stretched pattern.

In testimony whereof I aflix my signature.

KARL WENSCHOW. 

